• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Konferenzschrift
  4. Influence of rf substrate bias on density and mechanical properties of sputtered SiO2 thin films for SAW applications
 
  • Details
  • Full
Options
2018
Conference Paper
Title

Influence of rf substrate bias on density and mechanical properties of sputtered SiO2 thin films for SAW applications

Abstract
Amorphous SiO2 layers have been deposited on silicon and glass substrate by reactive magnetron sputtering. The influence of rf substrate bias on coating density and on further mechanical properties of the thin films as e.g. mechanical stress, hardness and Young's modulus was investigated. The results are correlated to a variation of the Si-O-Sibinding angle caused by the densification of the material. The precise adjustment of these thin film properties opens a wide potential for reactive sputtered coatings for ambitious applications such as e.g. surface acoustic wave (SAW) filters.
Author(s)
Täschner, Kerstin  
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP  
Hildisch, Jahn
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP  
Bartzsch, Hagen  orcid-logo
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP  
Modes, Thomas  
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP  
Zywitzki, Olaf  
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP  
Mainwork
Advanced coatings for large-area or high-volume products. The 12th International Conference on Coatings on Glass and Plastics : ICCG 12. CD-ROM  
Conference
International Conference on Coatings on Glass and Plastics (ICCG) 2018  
Language
English
Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP  
Keyword(s)
  • magnetron sputtering

  • silicon oxide

  • coating density

  • rf bias

  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024