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  4. The CAP-reactor, a novel microwave CVD system for diamond deposition
 
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2002
Journal Article
Title

The CAP-reactor, a novel microwave CVD system for diamond deposition

Other Title
Der CAP-Reaktor, ein neuartiges Mikrowellen CVD-System zur Diamantabscheidung
Abstract
The development and improvement of efficient microwave plasma reactors for diamond CVD is still an important topic and a prerequisite for the reliable production of high quality diamond films and wafers. We report on a novel reactor concept, the circumferential antenna plasma (CAP) reactor, which was developed on the basis of numerical FEM simulations. The electromagnetic field enters the plasma chamber through a ring-shaped circumferential window. The microwave power is guided to the window by radially expanding a coaxial waveguide. The design and simulation results of the CAP-reactor as well as a first prototype system powered by 6 kW microwave of 2.45 GHz will be described. The electric field distribution has been measured with a miniature microwave field probe and was found in perfect agreement with the FEM simulations. The CAP-reactor has been optimized to obtain a homogenous flat plasma distribution above the substrate holder. Under these conditions CVD-diamond films and wafers have been deposited. Preliminary results will be presented.
Author(s)
Pleuler, E.
Wild, C.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Füner, M.
Koidl, P.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Journal
Diamond and Related Materials  
DOI
10.1016/S0925-9635(01)00731-2
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Keyword(s)
  • microwave plasma

  • Mikrowellenplasma

  • CVD

  • reactor design

  • Reaktordesign

  • deposition

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