Title

Photomask and next-generation lithography mask technology XVII

Title Supplement

13 - 15 April 2010, Yokohama, Japan

Person Involved

Corporate Author

Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.

Publisher

Publishing Place

Bellingham, WA

Publication Date

2010

Series

Proceedings of SPIE; 7748

ISBN

978-0-8194-8238-9

Conference