Title

Advances in mirror technology for x-ray, EUV lithography, laser, and other applications

Title Supplement
7 - 8 August 2003, San Diego, California, USA. Papers presented at the Conference on Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications held as part of the 48th annual meeting of SPIE's International Symposium on Optical Science and Technology
Person Involved
Corporate Author
Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.
Publisher
Publishing Place
Bellingham, WA
Publication Date
2004
Series
Proceedings of SPIE; 5193
ISBN
0-8194-5066-9
Conference