Title

Optical microlithography XXIII

Title Supplement

23 - 25 February 2010, San Jose, California, United States; SPIE advanced lithography

Person Involved

Corporate Author

Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.

Semiconductor Manufacturing Technology Consortium -SEMATECH-

Publisher

Publishing Place

Bellingham, WA

Publication Date

2010

Series

Proceedings of SPIE; 7640

ISBN

978-0-8194-8054-5

Conference