Title

Photomask and next-generation lithography mask technology IX

Title Supplement

Contains the invited and contributed papers presented at Photomask Japan 2002, 23 - 25 April 2002, Yokohama, Japan

Person Involved

Corporate Author

Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.

Publisher

Publishing Place

Bellingham, WA

Publication Date

2002

Series

Proceedings of SPIE; 4754

ISBN

0-8194-4517-7

Conference