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High-Resolution Plasma Etching in Semiconductor Technology : Fundamentals, Processing and Equipment
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Project Title
High-Resolution Plasma Etching in Semiconductor Technology : Fundamentals, Processing and Equipment
OpenAIRE ID
574
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Start Date
January 1, 1985
End Date
January 1, 1989
Framework Progam
FP1
Funding Program
FP1-ESPRIT 1