Title

Photomask and next-generation lithography mask technology XIII

Title Supplement

18 - 20 April 2006, Yokohama, Japan

Person Involved

Corporate Author

Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.

Publisher

Publishing Place

Bellingham, WA

Publication Date

2006

Series

Proceedings of SPIE; 6283

ISBN

0-8194-6358-2

978-0-8194-6358-6

Conference