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1985
Journal Article
Title

Plasma focus as a radiation source for X-ray lithography

Author(s)
Eberle, J.
Krompholz, H.
Lebert, R.
Neff, W.
Noll, R.
Journal
Microelectronic engineering  
Language
English
Fraunhofer-Institut für Lasertechnik ILT  
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