Comparative study of ZrAlxOy - based MIM decoupling capacitors with high-κ dielectric grown by 3 generations of metalorganic ALD Zr-precursors

Under CopyrightFalidas, Konstantinos EfstathiosKonstantinos EfstathiosFalidasKühnel, KatiKatiKühnelViegas, Alison ErleneAlison ErleneViegasCzernohorsky, MalteMalteCzernohorsky2025-07-162025-07-162024-08-06https://doi.org/10.24406/publica-4883https://publica.fraunhofer.de/handle/publica/48956610.24406/publica-4883enComparative study of ZrAlxOy - based MIM decoupling capacitors with high-κ dielectric grown by 3 generations of metalorganic ALD Zr-precursorsposter