Advanced gate stack, source/drain and channel engineering for Si-based CMOS: New materials, processes, and equipment

Gusev, E.P.2022-03-022022-03-0220051-566-77463-2https://publica.fraunhofer.de/handle/publica/142044Advanced gate stack, source/drain and channel engineering for Si-based CMOS: New materials, processes, and equipment