Rudnay, A.D.A.D.Rudnay2022-03-082022-03-081996https://publica.fraunhofer.de/handle/publica/303531The invention relates to a device and a process for the vacuum vapour deposition of films using the film vapour deposition process which operates analogously to the known strip vapour deposition process, but also leaves open the possibility of vapour deposition on wide films. According to the invention, the vapour sources (B) are located between two heating sources (H), they are placed in a contactless arrangement in relation to the latter and are thus separated from each other by the heating sources (H). The process according to the invention is based on the use of the device according to the invention.de608664688patent1994-4439519