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  4. Erratum: Towards efficient structure prediction and pre-compensation in multi-photon lithography: publisher's note(Optics Express (2022) 30: 15 (28805) DOI: 10.1364/OE.462775)
 
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2022
Erratum
Title

Erratum: Towards efficient structure prediction and pre-compensation in multi-photon lithography: publisher's note(Optics Express (2022) 30: 15 (28805) DOI: 10.1364/OE.462775)

Abstract
This publisher's note contains a correction to [Opt. Express 30, 28805 (2022)]. In this article [1] a typo was corrected in the author affiliations. The article was corrected on 17 August 2022.
Author(s)
Lang, Nicolas
Enns, Sven
Hering, Julian
Freymann, Georg von  
Fraunhofer-Institut für Techno- und Wirtschaftsmathematik ITWM  
Journal
Optics Express  
Open Access
DOI
10.1364/OE.473590
Language
English
Fraunhofer-Institut für Techno- und Wirtschaftsmathematik ITWM  
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