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  4. A Review of Platinum Diffusion in Silicon and its Application for Lifetime Engineering in Power Devices
 
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2022
Review
Title

A Review of Platinum Diffusion in Silicon and its Application for Lifetime Engineering in Power Devices

Other Title
Ein Review der Platin-Diffusion in Silicium und ihre Anwendung für die Lebensdauereinstellung in Leistungsbauelementen
Abstract
In silicon power semiconductors, platinum is used to improve the switching characteristics of the devices by adjusting the lifetime of the minority charge carriers. Platinum diffusion in silicon has been a research topic for many scientists over the past decades. Herein, the current state of knowledge is presented together with the concepts developed for its use in silicon power devices. The relevant processes include diffusion from a platinum silicide, postimplantation annealing, and phosphorus-diffusion gettering. The evaluation of corresponding experiments and the calibration of the models have not only resulted in more narrow limits for the equilibrium concentrations of vacancies and self-interstitials in silicon and the transport capacity of interstitial platinum, but also in improved devices.
Author(s)
Johnsson, Anna  
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Schmidt, Gerhard
Infineon Technologies Austria AG
Hauf, Moritz
Infineon Technologies AG
Pichler, Peter  orcid-logo
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Journal
Physica status solidi. A  
Open Access
File(s)
Download (1.38 MB)
Rights
CC BY 4.0: Creative Commons Attribution
DOI
10.24406/publica-r-415415
10.1002/pssa.202100462
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Keyword(s)
  • lifetime engineering

  • phosphorus-diffusion gettering

  • platinum diffusion

  • platinum implantation

  • platinum silicide

  • silicon power devices

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