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  4. UV-enhanced substrate conformal imprint lithography using an epoxy based polymer
 
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2011
Poster
Title

UV-enhanced substrate conformal imprint lithography using an epoxy based polymer

Title Supplement
Poster at NNT 2011, 10th International Conference on Nanoimprint and Nanoprint Technology, 19.10.-21.10.2011, The Shilla Jeju, Korea
Author(s)
Fader, R.
Schmitt, H.
Rommel, Mathias  orcid-logo
Bauer, A.J.
Frey, L.
Ji, R.
Hornung, M.
Brehm, M.
Kraft, A.
Conference
International Conference on Nanoimprint and Nanoprint Technology (NNT) 2011  
DOI
10.24406/publica-fhg-374763
File(s)
002.pdf (387.08 KB)
Rights
Under Copyright
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Keyword(s)
  • substrate conformal imprint lithography

  • SCIL

  • soft lithography

  • UV curing epoxides

  • PDMS stamp

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