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  4. UV-enhanced substrate conformal imprint lithography using an epoxy based polymer
 
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2011
Poster
Title

UV-enhanced substrate conformal imprint lithography using an epoxy based polymer

Title Supplement
Poster at NNT 2011, 10th International Conference on Nanoimprint and Nanoprint Technology, 19.10.-21.10.2011, The Shilla Jeju, Korea
Author(s)
Fader, R.
Schmitt, H.
Rommel, Mathias  orcid-logo
Bauer, A.J.
Frey, L.
Ji, R.
Hornung, M.
Brehm, M.
Kraft, A.
Conference
International Conference on Nanoimprint and Nanoprint Technology (NNT) 2011  
File(s)
Download (387.08 KB)
Rights
Use according to copyright law
DOI
10.24406/publica-fhg-374763
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Keyword(s)
  • substrate conformal imprint lithography

  • SCIL

  • soft lithography

  • UV curing epoxides

  • PDMS stamp

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