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  4. Novel polymers for UV-enhanced substrate conformal imprint lithography
 
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2011
Poster
Title

Novel polymers for UV-enhanced substrate conformal imprint lithography

Title Supplement
Poster at MNE 2011, 37th International Conference on Micro&Nano Engineering 2011, 19.09.-23.09.2011, Berlin, Germany
Author(s)
Fader, R.
Schmitt, H.
Rommel, Mathias  orcid-logo
Bauer, A.J.
Frey, L.
Ji, R.
Hornung, M.
Brehm, M.
Vogler, M.
Conference
International Conference on Micro- and Nano-Engineering (MNE) 2011  
DOI
10.24406/publica-fhg-374761
File(s)
001.pdf (3.48 MB)
Rights
Under Copyright
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Keyword(s)
  • substrate conformal imprint lithography

  • SCIL

  • soft lithography

  • UV curing epoxides

  • PDMS stamp

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