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  4. Extraordinary low transmission of a metamaterial for application in lithography
 
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2010
Conference Paper
Title

Extraordinary low transmission of a metamaterial for application in lithography

Abstract
We present experiments on a metamaterial made from an ultrathin (< 40 nm) metal film. It exhibits extraordinary low transmission due to an antenna resonance and may form building blocks of future lithographic masks.
Author(s)
Dobmann, S.
Ploss, D.
Reibold, D.
Erdmann, A.  
Peschel, U.
Mainwork
Conference on Lasers and Electro-Optics and the Quantum Electronics and Laser Science Conference, CLEO/QELS 2010. CD-ROM  
Conference
Conference on Lasers and Electro-Optics Europe (CLEO) 2010  
Quantum Electronics and Laser Science Conference (QELS) 2010  
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
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