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  4. Boron-interstitial cluster kinetics: Extraction of binding energies from dedicated experiments
 
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2004
Conference Paper
Title

Boron-interstitial cluster kinetics: Extraction of binding energies from dedicated experiments

Other Title
Kinetik von Bor-Eingezwischengitteragglomeraten: Ermittlung der Bindungsenergie aus dedizierten Experimenten
Abstract
A description of the transient diffusion and activation of boron during post-implantation annealing steps is one of the most challenging tasks. In industrially relevant situation, it needs to address diffusion at extrinsic concentrations, the agglomeration of self-interstitials, and the formation of boron-interstitial clusters. This article describes the experimental work performed or used to calibrate model parameters as independently as possible. In particular, the experiments used to extract information about the energetics of boron-interstitial clusters are described.
Author(s)
Ortiz, C.J.
Pichler, P.  orcid-logo
Haublein, V.  
Mannino, G.
Scalese, S.
Privitera, V.
Solmi, S.
Lerch, W.
Mainwork
Silicon Front-End Junction Formation - Physics and Technology  
Conference
Materials Research Society (Spring Meeting) 2004  
Symposium C "Silicon Front-End Junction Formation - Physics and Technology" 2004  
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Keyword(s)
  • Bor

  • Silicium

  • Bor-Eingenzwischengitteragglomerat

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