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  4. Facet growth and geometry of the growth ridge during dynamic Czochralski processes
 
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2021
Journal Article
Title

Facet growth and geometry of the growth ridge during dynamic Czochralski processes

Abstract
The facet length and growth ridge geometry during Cz growth processes are analyzed both experimentally and theoretically. The experimental analysis is conducted based on the novel approach of measuring the growth ridge geometry by means of optical profilometry. A simple theoretical model is presented that describes the variations of the facet length and of the growth ridge extension. The origin of growth ridge asymmetry is explained as a result of crystal rotation and the relation between diffusive and convective heat transfer. An approach to extract the temperature gradient at the crystal surface above the interface is proposed. All theoretical deliberations are supported by experimental results.
Author(s)
Kranert, C.  
Raming, G.
Miller, A.
Reimann, C.  
Friedrich, J.  
Journal
Journal of Crystal Growth  
DOI
10.1016/j.jcrysgro.2021.126174
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
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