Functional and structural properties of thin electroceramic films by laser radiation

The deposition of single layer electroceramic thin films by pulsed excimer laser radiation (248 nm) on Ti/Pt/Si (111) substrates is investigated as a function af laser parameters (fluence, repetition rate, beam geometry) and processing variables (pressure and composition of processing gas, target-substrate arrangement) under conditions of various temporal and spatial properties of the involves vapor and/or plasma states represented in the type, number, ionization degree, momentum, and energy of the ensemble of species generated. The film characteristics were measured using scanning electron microscopy, X-ray diffraction, Raman spectroscopy, ellipsometry and impendance measurements. The experimental results are related to theoretical results of film growth calculating the densification of the films via momentum trasfer and the temperature of the films via energy storage. The film properties are dicussed in view of suitable permittivities and coupling coefficients for electrical, sensoric and actuatoric applications.