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1999
Journal Article
Title
PACVD-derived thin films in the system Si-B-C-N
Author(s)
Hegemann, Dirk
Riedel, R.
Oehr, Christian
Journal
Chemical vapor deposition: CVD
DOI
10.1002/(SICI)1521-3862(199903)5:2<61::AID-CVDE61>3.0.CO;2-Z
Language
English
Fraunhofer-Institut für Grenzflächen- und Bioverfahrenstechnik IGB
