Characterization of interface state densities by photocurrent analysis: Comparison of results for different insulator layers

In this work, silicon insulator interfaces are characterized by detailed photocurrent analysis. Results obtained for a variety of samples with different insulator layers and layer thicknesses are presented and discussed. The results show the applicability of the technique for a reliable process control and include data on high-k layers for the first time. Comparison of experiment and simulation is used to explain the injection level dependence of the measurements.