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2018
Book Article
Title

PECVD-AlOx

Abstract
The authors review developments in the use of PECVD in the growth of AlOx layers for solar cells. They consider the microwave PECVD and inductively coupled plasma PECVD methods, and the characteristics of layers grown by the 2 techniques, Si surface passivation, and solar cell applications.
Author(s)
Saint-Cast, Pierre  
Hofmann, Marc  
Mainwork
Surface passivation of industrial crystalline silicon solar cells  
DOI
10.1049/pbpo106e_ch5
Language
English
Fraunhofer-Institut für Solare Energiesysteme ISE  
Keyword(s)
  • Photovoltaik

  • Silicium-Photovoltaik

  • Oberflächen: Konditionierung

  • Passivierung

  • Lichteinfang

  • oxide

  • PECVD

  • passivation

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