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  4. Simultaneous measurement of surface geometry and film thickness distribution by retroreflex ellipsometry
 
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2025
Journal Article
Title

Simultaneous measurement of surface geometry and film thickness distribution by retroreflex ellipsometry

Abstract
A holistic approach to determine the surface orientation and film thickness for nonplanar isotropic three-phase systems (ambient-film-substrate) by retroreflex ellipsometry is presented. After scanning the surface of the sample, the ellipsometric parameters (Ψ, Δ), the surface orientation (θ 0 , ϕ) and the film thickness d can be measured simultaneously. Then, the surface geometry can be reconstructed by numerical gradient integration. The influence of the spot size and incident angle on the measurement results is simulated and discussed. The experiments show satisfactory results for film thickness distribution and surface geometry, which prove that the method is capable of measuring nonplanar surfaces.
Author(s)
Chen, Chia-Wei
Fraunhofer-Institut für Optronik, Systemtechnik und Bildauswertung IOSB  
Hartrumpf, Matthias  
Fraunhofer-Institut für Optronik, Systemtechnik und Bildauswertung IOSB  
Längle, Thomas  
Fraunhofer-Institut für Optronik, Systemtechnik und Bildauswertung IOSB  
Beyerer, Jürgen  
Fraunhofer-Institut für Optronik, Systemtechnik und Bildauswertung IOSB  
Journal
Measurement: sensors  
Conference
International Measurement Confederation (IMEKO World Congress) 2024  
Open Access
File(s)
Download (3.55 MB)
Rights
CC BY 4.0: Creative Commons Attribution
DOI
10.1016/j.measen.2024.101663
10.24406/publica-4921
Additional link
Full text
Language
English
Fraunhofer-Institut für Optronik, Systemtechnik und Bildauswertung IOSB  
Keyword(s)
  • Retroreflex ellipsometry

  • Mueller-matrix ellipsometry

  • Curved and tilted surfaces

  • Thin-film metrology

  • Surface topography

  • Optical surface measurement

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