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  4. Growth-temperature dependence of wetting layer formation in high density InGaAs/GaAs quantum dot structures grown by droplet epitaxy
 
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2012
Journal Article
Title

Growth-temperature dependence of wetting layer formation in high density InGaAs/GaAs quantum dot structures grown by droplet epitaxy

Abstract
We present a study of the growth-temperature-dependent wetting layer formation in self-assembled InGaAs/GaAs quantum dot structures formed by droplet epitaxy at elevated growth temperatures up to 500 \'01C. The energies of electron heavy-hole and light-hole transitions of the InGaAs wetting layer is investigated by contactless electroreflectance spectroscopy. A clear indication of a strong growth-temperature influence on the wetting layer morphology is observed. At the lowest growth temperature no wetting layer could be detected at all. The influence of the substrate temperature on structural and optical properties of the dots is also discussed.
Author(s)
Zürbig, V.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Bugaew, N.
Reithmaier, J.-P.
Kozub, M.
Musial, A.
Sek, G.
Misiewicz, J.
Journal
Japanese journal of applied physics  
DOI
10.1143/JJAP.51.085501
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
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