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2004
Conference Paper
Title

Status of Philips' extreme UV source

Abstract
The paper describes progress of the Philips' hollow cathode triggered (HCT) gas discharge EUV source. The program has been focussed on three major areas: (1) Studying the basic physics of ignition, pinch formation and EUV generation. The paper reports on progress in this area and particularly describes the underlying atomic physics both for Xe and Sn. (2) Discharge based on Sn. Results on overall efficiency more than 5 times the Xe efficiency are reported as well as high frequency operation up to 6.5 kHz. This system shows all the necessary ingredients for scaling to production power levels. (3) Integration of the Xe source in an alpha tool. Results on integration issues like electrode life time, collector life time and dose control will be presented.
Author(s)
Pankert, J.
Bergmann, K.
Klein, J.
Neff, W.
Rosier, O.
Seiwert, S.
Smith, C.
Probst, S.
Vaudrevange, D.
Siemons, G.
Apetz, R.
Jonkers, J.
Locken, M.
Derra, G.
Krücken, T.
Zink, P.
Mainwork
Emerging lithographic technologies VIII. Vol.1  
Conference
Conference "Emerging Lithographic Technologies" 2004  
DOI
10.1117/12.538041
Language
English
Fraunhofer-Institut für Lasertechnik ILT  
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