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  4. Plasma activated atmospheric pressure chemical vapor deposition
 
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2013
Conference Paper
Title

Plasma activated atmospheric pressure chemical vapor deposition

Author(s)
Thomas, M.
Mainwork
OTTI-Seminar CVD-Beschichtungstechnologien  
Conference
Seminar CVD-Beschichtungstechnologien 2013  
Language
English
Fraunhofer-Institut für Schicht- und Oberflächentechnik IST  
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