Temperature dependence of the optical properties of mixed oxide thin films deposited by reactive magnetron sputtering

The optical properties of TaZrOx mixed oxide thin films are investigated. The films were deposited by reactive pulsed magnetron sputtering in a double magnetron set up using two Ta and Zr metallic targets. Depending on the mixture of the materials, crystallization at different temperature occurs. For a specific mixture, temperature stability of more than 950°C could be demonstrated. This is more than another value of TiAlOx thin films reported very recently.