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Aspects of high aspect ratio silicon etching - capacitor application
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2018
Presentation
Title
Aspects of high aspect ratio silicon etching - capacitor application
Title Supplement
Presentation held at VDI GMM Workshop 2018, December 5th, Erlangen, Germany
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Author(s)
Rudolph, Matthias
Fraunhofer-Institut für Photonische Mikrosysteme IPMS
Pätzold, Björn
Fraunhofer-Institut für Photonische Mikrosysteme IPMS
Czernohorsky, Malte
Fraunhofer-Institut für Photonische Mikrosysteme IPMS
Conference
VDE/VDI-Gesellschaft Mikroelektronik, Mikro- und Feinwerktechnik (Fachtagung) 2018
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Language
English
Fraunhofer-Institut für Photonische Mikrosysteme IPMS
