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The impact of EUV mask defects on lithographic process performance
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2004
Conference Paper
Title
The impact of EUV mask defects on lithographic process performance
Author(s)
Evanschitzky, P.
Erdmann, A.
Mainwork
20th European Conference on Mask Technology for Integrated Circuits and Microcomponents. Proceedings
Conference
European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components (EMC) 2004
DOI
10.1117/12.568013
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB
