Advanced 3D packaging of chips and materials integrity: Stress-induced effects and mechanical properties of new ultra low-k dielectrics for on-chip interconnect stacks

Managing the emerging internal mechanical stress in chips particularly if they are 3D-tscked is a key task to maintain performance and reliability of microelectronic products. Hence, a strong need of a physics-based simulation methodology/flow emerges. This physics-based simulation, however, requires materials parameters with high accuracy. A full-chip analysis can then be performed, balancing the need for local resolution and computing time. Therefore, effective composite-type materials data for several regions of interest are needed. Advanced techniques to measure FEA-and design-relevant properties such as local and effective Youngs modulus and effective CTE values were developed and described in this paper. These data show a clear orientation dependence, caused by the chip design.