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  4. Preparation of metal nanosuspensions by high-pressure dc-sputtering on running liquids
 
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1997
Conference Paper
Title

Preparation of metal nanosuspensions by high-pressure dc-sputtering on running liquids

Abstract
A modified VERL-process (Vacuum evaporation on running liquids) employing high pressure magnetron sputtering has been used for the preparation of metal nanosuspensions.The method has been tested in the case of Ag/organic liquid and Fe/organic liquid suspensions by varying the pressure of the Argon sputtering atmosphere in the range of 1 to 30 Pa. A sharp particle size distribution with a mean particle diameter ranging from 5-15 nm has been found. The mean particle size increases with increasing Argon pressure. A descriptive model for the process of particle formation as a function of sputtering gas pressure has been developed.
Author(s)
Wagener, M.
Günther, B.
Murty, B.S.
Mainwork
Nanophase and nanocomposite materials II  
Conference
Symposium Nanophase and Nanocomposite Materials 1996  
Materials Research Society (Fall Meeting) 1996  
Language
English
Fraunhofer-Institut für Fertigungstechnik und Angewandte Materialforschung IFAM  
Keyword(s)
  • magnetic fluid

  • metal nanosuspension

  • nanoparticle

  • sputtering

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