Structural features and nitrogen positions in titanium oxynitride films grown in plasma of magnetron discharge

The paper addresses the results of the analysis of the structural features of nitrogen-containing titanium oxides films, deposited by reactive magnetron sputtering. The films have a nanocrystalline two-phase structure and consist of anatase and rutile crystallites, regardless of the coating deposition regimes. No traces of titanium nitride phase are found in the film and nitrogen atoms in oxide form are localized at the grain boundaries of the deposited film.