2009
Conference Paper
Title

PML2: The maskless multibeam solution for the 22nm node and beyond

Abstract
Projection Mask-Less Lithography (PML2) is a potentially cost-effective multi electron-beam solution for the 22 nm half-pitch node and beyond. PML2 is targeted on using hundreds of thousands of individually addressable electron-beams working in parallel, thereby pushing the potential throughput into the wafers per hour regime. With resolution potential of < 10 nm, PML2 is designed to meet the requirements of several upcoming tool generations.
Author(s)
Klein, C.
Platzgummer, E.
Klikovits, J.
Piller, W.
Loeschner, H.
Bejdak, T.
Dolezel, P.
Kolarik, V.
Klingler, W.
Letzkus, F.
Butschke, J.
Irmscher, M.
Witt, M.
Pilz, W.
Jaschinsky, P.
Thrum, F.
Hohle, C.
Kretz, J.
Nogatch, J.T.
Zepka, A.
Mainwork
Conference
DOI
Language
English