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  4. Antireflection coatings for ultraviolet radiation obtained by molecular beam deposition
 
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1996
Journal Article
Title

Antireflection coatings for ultraviolet radiation obtained by molecular beam deposition

Abstract
Fluoride antireflection coatings on MgF2 substrates for a wavelength of 248 nm have been deposited by molecular beam deposition. Transmission and laser induced damage threshold of the samples have been measured and AFM investigations have been carried out. A 14-layer design for AR coatings with sublayer thicknesses of 12 nm is compared with a conventional 2-layer design with quarter wavelength thicknesses. The laser induced damage threshold of the 14-layer coating is slightly higher than that of the 2-layer coating. AFM surface images show that the 14-layer coating has a smoother surface than the 2-layer-coating.
Author(s)
Laux, S.
Mann, K.
Granitza, B.
Kaiser, U.
Richter, W.
Journal
Applied optics  
DOI
10.1364/AO.35.006216
Language
English
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
Keyword(s)
  • antireflection coating

  • Antireflex-Beschichtung Ultraviolett

  • Fluoride

  • fluorides

  • laser induced damage threshold

  • laserinduzierte Zerstörschwelle

  • molecular beam deposition

  • Molekularstrahl-Abscheidung

  • ultraviolet

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