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1997
Conference Paper
Title
Evaluation of defect densities on LP-MOVPE grown InGaAsP in dependence of InP substrate type
Abstract
Although an assessment of growth defects appears to be a very complex matter due to the various growth and substrate parameters and the statistics involved this study has shown that the substrate orientation has a major impact on the type and density of surface growth defects. The dopant type of the substrate has the main effect on the EPD and, along with this, on the growth defect density, but no effect on the defect type.
Language
English
Keyword(s)
crystal orientation
gallium arsenide
gallium compounds
iii-v semiconductors
indium compounds
point defects
semiconductor epitaxial layers
semiconductor growth
vapour phase epitaxial growth
defect densities
lp-movpe grown InGaAsP
InP substrate type
growth defects
substrate orientation
surface growth defects
dopant type
growth defect density
defect type
InGaAsP
inp