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  4. Impact of Al content on transport properties of two-dimensional electron gas in GaN/Al(x)Ga(1-x)N/GaN heterostructures
 
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2010
Journal Article
Title

Impact of Al content on transport properties of two-dimensional electron gas in GaN/Al(x)Ga(1-x)N/GaN heterostructures

Abstract
The influence of the Al content on the mobility of the two-dimensional electron gas (2DEG) in GaN/Al(x)Ga(1-x)N/GaN heterostructures is studied by employing the ensemble Monte Carlo method. Using two interface polarization charge models, we calculate the room temperature low-field mobility at different Al compositions of the barrier layer ranging from 8% up to 35%. All relevant scattering mechanisms are considered to provide a quantitative description of the measured mobilities. We show that 2DEG transport in the heterostructures is mostly affected by dislocation scattering for all Al contents examined. The role of alloy scattering and interface roughness scattering is also discussed.
Author(s)
Polyakov, V.M.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Cimalla, Volker  orcid-logo
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Lebedev, Vadim  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Köhler, Klaus  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Müller, Stefan  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Waltereit, Patrick  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Ambacher, Oliver  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Journal
Applied Physics Letters  
DOI
10.1063/1.3499656
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
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