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New concept for applying edge line phase-shifting masks to arbitrary mask layouts
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1996
Journal Article
Title
New concept for applying edge line phase-shifting masks to arbitrary mask layouts
Author(s)
Weiß, M.
Henke, W.
Journal
Microelectronic engineering
DOI
10.1016/0167-9317(95)00215-4
Language
English
Fraunhofer-Institut für Siliziumtechnologie ISIT
