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Low energy electron lithography; energy control and variable energy exposure
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1995
Journal Article
Title
Low energy electron lithography; energy control and variable energy exposure
Author(s)
Brünger, W.
Kley, E.-B.
Schnabel, B.
Stolberg, I.
Zierbock, M.
Plontke, R.
Journal
Microelectronic engineering
Conference
International Conference on Micro- and Nano-Engineering 1994
Language
English
Fraunhofer-Institut für Siliziumtechnologie ISIT
