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  4. Single-frame randomized probe imaging in the EUV using a high-order harmonic source
 
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2026
Journal Article
Title

Single-frame randomized probe imaging in the EUV using a high-order harmonic source

Abstract
We report the demonstration of single-frame randomized probe imaging (RPI) using a 13.5 nm extreme ultraviolet (EUV) beam from a table-top high-harmonic generation (HHG) source. Three types of beams—a smooth, vortex, and speckle beam—were used to investigate the effect of different illuminations on image quality. Single-frame RPI reconstructions were successfully achieved for all beam types, with the highest resolution of 110 nm obtained using the EUV speckle beam. Comparisons with ptychography reconstructions confirm the advantages of structured illuminations over a smooth beam, showing improved convergence and image fidelity. Furthermore, averaging a small number of RPI images reconstructed from individual diffraction patterns significantly improves the resolution to sub-100 nm. These results demonstrate the capability of single-frame RPI to deliver rapid, high-resolution EUV imaging, offering a promising approach for applications limited by acquisition time, such as ultrafast pump-probe studies and real-time feedback.
Author(s)
Chew, Soo Hoon
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
Eschen, Wilhelm
Friedrich-Schiller-Universität Jena
Liu, Chang
Friedrich-Schiller-Universität Jena
Abdelaal, Mahmoud
Friedrich-Schiller-Universität Jena
Limpert, Jens  
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
Rothhardt, Jan  
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
Journal
Optics Express  
Funder
European Social Fund Plus
Open Access
File(s)
Download (8.21 MB)
Rights
CC BY 4.0: Creative Commons Attribution
DOI
10.1364/OE.580785
10.24406/publica-8049
Additional link
Full text
Language
English
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
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