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Characterization of silicon open stencil masks in an ion projection lithography machine
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1991
Journal Article
Title
Characterization of silicon open stencil masks in an ion projection lithography machine
Author(s)
Mescheder, U.
Buchmann, L.-M.
Torkler, M.
Journal
Microelectronic engineering
Conference
International Conference on Microlithography: Microcircuit Engineering (ME) 1990
Language
English
Fraunhofer-Institut für Siliziumtechnologie ISIT
