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Process integration of infrared-sensitive PIN photodiodes and CMOS transistors in a single-SiGe substrate
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2005
Conference Paper
Title
Process integration of infrared-sensitive PIN photodiodes and CMOS transistors in a single-SiGe substrate
Author(s)
Nebrich, L.
Neumeier, K.
Stadler, A.
Weber, J.
Bensch, F.
Kreuzer, S.
Vogg, G.
Herrmann, K.
Klumpp, A.
Wieland, R.
Bonfert, D.
Soldner, W.
Ramm, P.
Mainwork
Second International SiGe Technology and Device Meeting, ISTDM 2004. Proceedings
Conference
International SiGe Technology and Device Meeting (ISTDM) 2004
DOI
10.1016/j.mssp.2004.07.008
Language
English
Fraunhofer-Institut für Zuverlässigkeit und Mikrointegration IZM