• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Konferenzschrift
  4. Process integration of infrared-sensitive PIN photodiodes and CMOS transistors in a single-SiGe substrate
 
  • Details
  • Full
Options
2005
Conference Paper
Title

Process integration of infrared-sensitive PIN photodiodes and CMOS transistors in a single-SiGe substrate

Author(s)
Nebrich, L.
Neumeier, K.
Stadler, A.
Weber, J.
Bensch, F.
Kreuzer, S.
Vogg, G.
Herrmann, K.
Klumpp, A.
Wieland, R.
Bonfert, D.
Soldner, W.
Ramm, P.
Mainwork
Second International SiGe Technology and Device Meeting, ISTDM 2004. Proceedings  
Conference
International SiGe Technology and Device Meeting 2004  
DOI
10.1016/j.mssp.2004.07.008
Language
English
Fraunhofer-Institut für Zuverlässigkeit und Mikrointegration IZM  
  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024