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In situ measurement for resist thickness control and development endpoint detection
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1992
Journal Article
Title
In situ measurement for resist thickness control and development endpoint detection
Author(s)
Roeder, G.
Ryssel, H.
Temmel, G.
Journal
Microelectronic engineering
Conference
International Conference on Microlithography: Microcircuit Engineering 1991
Language
English
IIS-B
