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  4. Point focusing with flat and wedged crossed multilayer Laue lenses
 
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2017
Journal Article
Title

Point focusing with flat and wedged crossed multilayer Laue lenses

Abstract
Point focusing measurements using pairs of directly bonded crossed multilayer Laue lenses (MLLs) are reported. Several flat and wedged MLLs have been fabricated out of a single deposition and assembled to realise point focusing devices. The wedged lenses have been manufactured by adding a stress layer onto flat lenses. Subsequent bending of the structure changes the relative orientation of the layer interfaces towards the stress-wedged geometry. The characterization at ESRF beamline ID13 at a photon energy of 10.5 keV demonstrated a nearly diffraction-limited focusing to a clean spot of 43 nm × 44 nm without significant side lobes with two wedged crossed MLLs using an illuminated aperture of approximately 17 µm × 17 µm to eliminate aberrations originating from layer placement errors in the full 52.7 µm × 52.7 µm aperture. These MLLs have an average individual diffraction efficiency of 44.5%. Scanning transmission X-ray microscopy measurements with convenient working distances were performed to demonstrate that the lenses are suitable for user experiments. Also discussed are the diffraction and focusing properties of crossed flat lenses made from the same deposition, which have been used as a reference. Here a focal spot size of 28 nm × 33 nm was achieved and significant side lobes were noticed at an illuminated aperture of approximately 23 µm × 23 µm.
Author(s)
Kubec, Adam
Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS  
Melzer, Kathleen
Fraunhofer-Institut für Keramische Technologien und Systeme IKTS  
Gluch, Jürgen
Fraunhofer-Institut für Keramische Technologien und Systeme IKTS  
Niese, Sven
AXO Dresden GmbH
Braun, Stefan
Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS  
Patommel, Jens
TU Dresden
Burghammer, Manfred
ESRF
Leson, Andreas  
Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS  
Journal
Journal of synchrotron radiation  
Project(s)
Master 3D
3D-Innopro
ENano
Funder
Bundesministerium für Bildung und Forschung  
Bundesministerium für Bildung und Forschung  
European Commission  
Open Access
File(s)
Download (1018.94 KB)
DOI
10.1107/S1600577517001722
10.24406/publica-r-247350
Additional link
Full text
Language
English
Fraunhofer-Institut für Keramische Technologien und Systeme IKTS  
Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS  
Keyword(s)
  • multilayer Laue lens

  • X-ray nanofocusing

  • ptychography

  • scanning X-ray microscopy

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