• English
  • Deutsch
  • Log In
    or
  • Research Outputs
  • Projects
  • Researchers
  • Institutes
  • Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Konferenzschrift
  4. Infrared birefringence imaging of residual stress and bulk defects in multicrystalline silicon
 
  • Details
  • Full
Options
2010
Conference Paper
Titel

Infrared birefringence imaging of residual stress and bulk defects in multicrystalline silicon

Abstract
We explore the potential of infrared birefringence imaging (IBI) to reveal a complete picture of macro- and microscopic internal stresses and their origins in multicrystalline silicon (mc-Si). We present a method to decouple macroscopic thermally induced residual stresses and microscopic bulk defect-related stresses, and validate this method in mc-Si wafers via microstructural analysis. We then describe the unique IR birefringence signatures, including stress magnitudes and directions, of common microdefects in mc-Si solar cell materials: -SiC and -Si3N4 microdefects, twin bands, non-twin grain boundaries, and dislocation bands. We relate observed stresses to other topics of interest in solar cell manufacturing, including wafer mechanical strength and minority carrier lifetime.
Author(s)
Ganapati, V.
Schoenfelder, S.
Castellanos, S.
Oener, S.
Buonassisi, T.
Hauptwerk
35th IEEE Photovoltaic Specialists Conference, PVSC 2010. Vol.2
Konferenz
Photovoltaic Specialists Conference (PVSC) 2010
Thumbnail Image
DOI
10.1109/PVSC.2010.5614228
Language
English
google-scholar
CSP
IWM-H
  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Send Feedback
© 2022