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  4. Materials and device characteristics of single and double sided delta-doped pseudomorphic InxGa1-xAs/Al0.3Ga0.7As/GaAs high electron mobility transistors.
 
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1990
Conference Paper
Titel

Materials and device characteristics of single and double sided delta-doped pseudomorphic InxGa1-xAs/Al0.3Ga0.7As/GaAs high electron mobility transistors.

Alternative
Material und Bauelement Charakteristika von einseitig und doppelseitig delta-dotierten InxGa1-xAs/Al0.3Ga0.7As/GaAs HEMT-Strukturen
Author(s)
Ganser, P.
Hülsmann, A.
Köhler, K.
Schweizer, T.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF
Tasker, P.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF
Hauptwerk
Electronic, optical and device properties of layered structures. Proceedings of Symposium B, 1990 Fall Meeting of the Materials Research Society
Konferenz
Materials Research Society (Fall Meeting) 1990
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Language
English
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Fraunhofer-Institut für Angewandte Festkörperphysik IAF
Tags
  • heterostructure

  • Heterostruktur

  • III-V Bauelementeigen...

  • III-V device properti...

  • III-V material proper...

  • III-V Materialeigensc...

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