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Electrodeposition of photoresist: process optimization and chemical resistance
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1999
Conference Paper
Title
Electrodeposition of photoresist: process optimization and chemical resistance
Author(s)
Schnupp, R.
Baumgärtner, R.
Kühnhold, R.
Ryssel, H.
Mainwork
Eurosensors XIII
Conference
Eurosensors 1999
Language
English
IIS-B
