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  4. A Low Damage Patterning Scheme for Ultra Low-k Dielectrics
 
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2012
Journal Article
Title

A Low Damage Patterning Scheme for Ultra Low-k Dielectrics

Author(s)
Zimmermann, Sven
Ahner, N.
Fischer, Tobias  
Oszinda,T.
Uhlig, B.
Schulz, Stefan E.  
Geßner, Thomas  
Journal
Future fab international  
Language
English
Fraunhofer-Institut für Elektronische Nanosysteme ENAS  
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