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Coupled simulation of oxidation and diffusion in VLSI wafer fabrication
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1997
Conference Paper
Title
Coupled simulation of oxidation and diffusion in VLSI wafer fabrication
Author(s)
Hackenberg, M.
Joppich, W.
Mijalkovic, S.
Sontowski, T.
Mainwork
15th IMACS World Congress on Scientific Computation, Modelling and Applied Mathematics 1997. Vol.3: Computational physics, chemistry and biology
Conference
World Congress on Scientific Computation, Modelling and Applied Mathematics 1997
Language
English
Fraunhofer-Institut für Algorithmen und Wissenschaftliches Rechnen SCAI
