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  4. Superior microwave performance of InGaAs JFETs grown by MBE
 
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1990
Journal Article
Title

Superior microwave performance of InGaAs JFETs grown by MBE

Abstract
The realisation of high performance InGaAs JFETs designed for InP based optoelectronic integration is reported. An optimised MBE process for the gate layer growth is presented. JFETs fabricated by using a self-aligning technique exhibit very high cut-off frequencies of fT=28 GHz and fMAX=38 GHz.
Author(s)
Trommer, D.
Umbach, A.
Passenburg, W.
Mekonnen, G.
Unterborsch, G.
Journal
Electronics Letters  
DOI
10.1049/el:19900479
Language
English
Fraunhofer-Institut für Nachrichtentechnik, Heinrich-Hertz-Institut HHI  
Keyword(s)
  • gallium arsenide

  • iii-v semiconductors

  • indium compounds

  • integrated optoelectronics

  • junction gate field effect transistors

  • molecular beam epitaxial growth

  • semiconductor growth

  • solid-state microwave devices

  • oeic

  • microwave performance

  • jfets

  • optimised mbe process

  • gate layer growth

  • self-aligning technique

  • 28 GHz

  • 38 GHz

  • InGaAs

  • InP based optoelectronic integration

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