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1990
Journal Article
Title
Superior microwave performance of InGaAs JFETs grown by MBE
Abstract
The realisation of high performance InGaAs JFETs designed for InP based optoelectronic integration is reported. An optimised MBE process for the gate layer growth is presented. JFETs fabricated by using a self-aligning technique exhibit very high cut-off frequencies of fT=28 GHz and fMAX=38 GHz.
Keyword(s)
gallium arsenide
iii-v semiconductors
indium compounds
integrated optoelectronics
junction gate field effect transistors
molecular beam epitaxial growth
semiconductor growth
solid-state microwave devices
oeic
microwave performance
jfets
optimised mbe process
gate layer growth
self-aligning technique
28 GHz
38 GHz
InGaAs
InP based optoelectronic integration